Education
2004.92008.7  B.S., Nanjing University, P.R. China. 
2008.9-2013.7  Ph.D., Peking University, P.R. China. 

Work Experience
2014.2  present  Postdoctoral Associate, Department of Electrical Engineering & Computer Science, Massachusetts Institute of Technology

Research Interest 
1）Design new strategies to make novel 2D materials and heterostructures；
2）Chemical modification of materials；
3）Characterizations of 2D materials and applications in high-performance electronics, optoelectronics, catalysis and energy. 

1. L. Zhou, S. X. Huang, Y. Tatsumi, L. J. Wu, H. H. Guo, Y. Q. Bie, K. Ueno, T. Yang, Y. M. Zhu, J. Kong, R. Saito, M. S. Dresselhaus, “A Sensitive Phonon-Based Probe for Structure Identification of 1T’ MoTe2”, J. Am. Chem. Soc. 139 (2017) 1396.
2. L. Zhou, K. Xu, A. Zubair, X. Zhang, F. P. Ouyang, T. Palacios, M. S. Dresselhaus, Y. F. Li, J. Kong, “Role of Molecular Sieves in the CVD Synthesis of Large-Area 2D MoTe2”,Adv. Funct. Mater. 27 (2017) 1603491.
3. L. Zhou, A. Zubair, Z. Q. Wang, X. Zhang, F. P. Ouyang, W. J. Fang, K. Ueno, J. Li, T. Palacios, J. Kong, M. S. Dresselhaus, “Synthesis of High-Quality Large-Area Homogenous 1T’ MoTe2 from Chemical Vapor Deposition”, Adv. Mater. 28 (2016) 9526.
4. L. Zhou, L. Lei, J. Y. Wang, J. W. Yu, D. H. Li, Q. Xie, Z. R. Liu, Y. L. Yang,X. F. Guo, Z. F. Liu, “Substrate-Induced Graphene Chemistry for 2D Superlattices with Tunable Periodicities”, Adv. Mater. 28 (2016) 2148. (Cover article)
5. L. Zhou, K. Xu, A. Zubair, A. D. Liao, W. J. Fang, F. P. Ouyang, Y. H. Lee, K. Ueno, R. Saito, T. Palacios, J. Kong, M. S. Dresselhaus, “Large-Area Synthesis of High-Quality Uniform Few-layer MoTe2”, J. Am. Chem. Soc. 137 (2015) 11892. (Front page in MIT News)
6. B. Li, L. Zhou (joint first author), D. Wu, H. L. Peng, K. Yan, Y. Zhou, Z. F. Liu, “Photochemical Chlorination of Graphene”, ACS. Nano 5 (2011) 5957.

Thousand Talents Program for Distinguished Young Scholars, 2018  

Positions Available
Undergraduates, graduate students, PhD students, and postdocs who has chemistry, materials, physics and electrical engineering backgrounds are welcome to join the group.